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193nm Low Order Waveplate

deep ultraviolet waveplate
193nm Low Order Waveplate

193nm Low Order Waveplate, a deep ultraviolet polarization device, precisely adjusts incident light's polarization state. Used in DUV systems like lithography and laser research, it's made of 193nm-radiation-resistant materials for stability and accuracy.

 

Features:

Thickness: 0.1-0.5 mm

High Damage Threshold

 

  • Item No :

    WPL
  • Product Origin :

    FuZhou
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Specifications:  

Material:
Quartz
Diameter Tolerance:
+0.0, -0.1mm
Wavefront Distortion:
λ/8 @ 632.8nm
Retardation Tolerance:
λ/50
Parallelism:
<1 arc second
Surface Quality:
20/10
Clear Aperture:
>90%
Coating:
S1&S2: R<0.2% @ wavelength
Standard wavelength:
193.368nm

 

193nm Products:

Half Waveplates P/N#
Quarter Waveplates P/N#
Diameter(mm)
WPL-210-193
WPL-410-193
10.0
WPL-212-193
WPL-412-193
12.7
WPL-215-193
WPL-415-193
15.0
WPL-220-193
WPL-420-193
20.0
WPL-225-193
WPL-425-193
25.4
WPL-230-193
WPL-430-193
30.0
WPL-235-193
WPL-435-193
35.0
WPL-250-193
WPL-450-193
50.0

 

Technical Advantages of 193nm Multi-order Waveplates:
193nm multi-order waveplates achieve high-magnitude phase retardation by optimizing birefringent materials tailored for deep ultraviolet wavelengths and combining ion beam finishing technology. Its key advantages include high retardation precision with phase errors <±1% at the 193nm wavelength — The application of ion beam finishing technology significantly reduces the micro-deviations in the optical thickness of materials, thereby providing more precise polarization control for deep ultraviolet laser systems such as excimer lasers. Its compact structure eliminates the need for complex cascading designs, making it highly suitable for integrated deep ultraviolet optical modules in lithography systems; a high laser damage threshold (>5 J/cm² @ 193nm) ensures its reliability in high-power deep ultraviolet applications, while the ultra-smooth surface formed by ion beam finishing further reduces the risk of local energy accumulation under high-energy laser irradiation. In deep ultraviolet spectral polarization measurement systems, the stable phase retardation ensured by ion beam finishing keeps the polarization degree measurement error within 2%, facilitating high-precision polarization analysis in scenarios such as photoresist characterization and atmospheric ozone layer spectroscopy.

 

 

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